Перегляд Публікації співробітників бібліотеки по виданням, що містить "Karlsruhe, Germany in conjunction with Institute «SE&E»"
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Optimization of two-layer resists for laser lithography on substrates required for wide application in microwave sensor technology
(Karlsruhe, Germany in conjunction with Institute «SE&E», 2020)We report on the optimization of laser lithography on various substrates relevant for ultra-high frequency on-chip experiments. We`re aiming at fabricating microstructured photoconductive switches for transport experiments ...