Пристрій для визначення закінчення процесу плазмового травлення

Abstract

A device for the determination of the plasma etching process end comprises a laser as a source of light, condenser, rotary mirror, diaphragm and a plasma reactor with plates that are to be treated, and with optical window for input and output of optical radiation. The laser is optically connected to a photo converter that comprises a photo-resistor, two bipolar transistors, five resistors, two vessels and one source of direct voltage. The photo converter comprises the second source of direct voltage and inductance, at that the first output of the photo-resistor is connected to the second output of inductance, and the other output of the photo-resistor is connected to the second outputs of the pole of the first and the second sources of direct voltage. The first output of the pole of the second source of direct voltage through the first resistor is connected to the emitter of the first bipolar transistor, the first output of inductance is connected to the collector of the first bipolar transistor and the base of the second bipolar transistor. The base of the first bipolar transistor is connected through the second resistor to the first pole of the first source of direct voltage and is connected to the collector of the second bipolar transistor, collector of the first bipolar transistor is connected to the base of the second bipolar transistor collector of which is connected through the second resistor to the first pole of the first source of direct voltage.