Багатоканальні системи для оптичного емісійно-спектрального контролю плазмохімічних процесів травлення мікроструктур

Abstract

The problems of improving effective control of plasma etching of microstructures due to the introduction of multichannel systems of recording and processing of the own emission spectrum of a nonequilibrium plasma are considered. The principles of construction of such systems and the prospects for their use in technological terms are analyzed.